We are very excited to be one of the presenters at AVS 20th International Conference on Atomic Layer Deposition (ALD 2020).
During the conference, we will be presenting our latest R&D results from our printing process. We demonstrate that we are able to provide stable printing with exemplary materials TiO2 and Pt, furthermore, we show evidence that these thin films are deposited in the ALD growth regime, in a fully constrained selective area manner.
Make sure to tune in to our pre-recorded presentation A2324: AM-TuA4 An Atomic-Layer 3D Printer here*.
Reach out to us to learn more about our revolutionary ALD technology and ways for you to advance your R&D and product development.
We are also looking for a talented microtechnology engineer to join our team.
Interested? Find out more and apply here.
The ATLANT 3D team!
*Access available only to the conference attendees.
