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Our technology offers precise, scalable atomic layer manufacturing for rapid creation of micro and nanodevices.

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One Technology with Multi-Faceted Process Capabilities wot Advanced Manufacturing

Revolutionary technology that enables multi-material, atomically precise, highly scalable atomic layer advanced manufacturing for rapid prototyping and manufacturing of micro and nanodevices.

Enabling multi-material deposition in one process, tested on a wide range of advanced materials, independent of surface roughness and substrate sensitivity with multi-shape deposition and a high degree of thickness control.

Find out what endless possibilities feel like with our products and services.

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ATLANT 3D proprietary rapid and direct atomic layer processing technology DALP™ offers maskless process flexibility and unparalleled prototyping speed – reducing the time of design iterations, resource dependencies and overall cost of innovation.

Academia & Research

NANOFABRICATOR™ LITE

The material innovation and prototyping platform

Suitable for a wide range of applications such as MEMS and sensors, optics, photonics, advanced packaging, microelectronics as well as emerging applications. Designed as a compact and versatile tool to seamlessly integrate into your lab infrastructure.

  • Up to 2 Materials
  • 400 µm Line Width
  • Sample size up to up to 4″ (100mm)
  • Deposition Speed up to 200 mm/s
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Industrial R&D

NANOFABRICATOR™ PRO

Advanced micro- and nano-scale fabrication

Sophisticated platform for material innovation and small batch prototyping. It features a versatile setup, offering rapid deposition speeds tailored to specific sample and process requirements. An efficient tool for advanced nanofabrication tasks.

  • Up to 6 Materials
  • 100 µm Line Width
  • Sample size up to up to 8″ (200mm)
  • Deposition Speed up to 500 mm/s
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In-Space Manufacturing

NANOFABRICATOR™ 0G

Pioneering advanced material innovation in space and labs

Pioneering advanced material innovation in space and labs: revolutionizing space-based manufacturing and expanding horizons with atomic precision in material science.

  • Advanced Material Deposition: capable of depositing a wide range of materials with atomic precision essential for intricate micro and nanodevices.
  • Zero Gravity Adaptability: specifically engineered to operate in micro and zero gravity environments maintaining functionality and precision.
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DALP™ Technology

Rapid, flexible & versatile atomically precise processing

Our patent pending rapid and direct atomic layer processing technology DALP™ offers rapid material and process development and testing, maskless process flexibility, and unparalleled prototyping speed, reducing the time of design iterations, resource allocation and cost of innovation. ​

​NANOFABRICATOR™ series enables multi-material deposition in one process, tested on a wide range of advanced materials, independent of surface roughness and substrate sensitivity with multi-shape deposition and a high degree of thickness control. ​

Line Width

400 µm now, 25 µm in development, 1 µm long term goal