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NANOFABRICATOR® LITE

The Benchtop Platform for Materials, Process and Device R&D

Materials innovation depends on the ability to move quickly from an idea to a physical experiment. But conventional materials development often relies on multiple tools, masks, lithography steps, and separate fabrication workflows.

NANOFABRICATOR® LITE brings localized atomic-scale materials processing directly into the R&D environment.

Powered by ATLANT 3D’s proprietary Direct Atomic Layer Processing (DALP®) technology, LITE enables localized deposition and etching, multi-material processing, and rapid device prototyping within a compact, software-controlled platform.

Designed for scientific R&D, it gives researchers a flexible way to explore materials, develop processes, and fabricate experimental structures without relying on conventional lithography-based workflows.

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Bring Atomic-Scale Processing
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From AI Discovery to Physical Material


From Material Idea to Physical Experiment

New material concepts need to be physically created, tested, and refined before their potential can be understood.

NANOFABRICATOR® LITE provides researchers with a flexible platform for translating experimental designs into physical materials and structures.

Using DALP®, material placement, processing locations, and deposition parameters can be digitally defined and executed directly on the substrate. Researchers can explore localized materials, multilayer structures, and different experimental configurations while rapidly iterating between design and fabrication.

The result is a more direct workflow from material idea to physical experiment.



More Experiments from Every Substrate


Localized Atomic-Scale Processing

DALP® enables direct, localized atomic-scale materials processing by positioning a micronozzle at a controlled working distance above a moving substrate.

Reactive gases are confined to the processing area, enabling materials to be deposited only where specified.

NANOFABRICATOR® LITE supports localized atomic layer processes including deposition and etching, giving researchers greater control over where and how materials are processed.

Its interchangeable DALP® micronozzle architecture provides a standard line width of 350–400 µm, with finer-resolution nozzles in development.



Atomic Precision, Software Defined


Multi-Material Experimentation

Materials innovation rarely depends on a single material.

NANOFABRICATOR® LITE enables researchers to explore multiple materials and material combinations within the same platform, supporting the development of localized coatings, multilayer structures, interfaces, and experimental devices.

The platform can be configured with up to six bubblers, including three precursor and three reactant bubblers, as well as additional gas lines including ozone.

This flexibility enables researchers to investigate new material combinations and rapidly refine experimental conditions as their research evolves.



Device-Relevant Materials by Design


Maskless, Lithography-Free Fabrication

Conventional device fabrication often requires multiple processing steps, including masks, photoresist, lithography, and transfers between different tools.

DALP® enables materials to be processed directly where they are needed.

NANOFABRICATOR® LITE supports direct-write localized processing without shadow masks or multi-step lithography, reducing the number of fabrication steps required to move from an experimental design to a physical structure.

This gives researchers greater flexibility to modify designs, explore new geometries, and iterate rapidly during early-stage materials and device development.



Process Development to Industrial Transfer


Software-Defined from Design to Fabrication

NANOFABRICATOR® LITE connects digital experimental design with automated physical processing through ATLANT 3D’s software environment.

DALP® Designer enables researchers to import or create experimental designs, assign material recipes, define deposition properties, preview processes, and prepare projects for fabrication.

DALP® Pilot controls the physical process, enabling automated deposition, job scheduling, machine monitoring, and process telemetry.

Together, they create a connected workflow from digital design to physical experimentation.



AI-to-Matter Infrastructure


Built for Advanced Research

NANOFABRICATOR® LITE is designed for scientific and advanced R&D environments where flexibility and rapid experimentation are essential.

The platform supports research across materials development, process optimization, device prototyping, electronics, sensors, energy technologies, and other emerging applications.

Researchers are already using LITE-enabled capabilities to explore areas including next-generation batteries, analog neuromorphic computing, high-power GaN electronics, perovskite solar cells, electronic devices, sensors, and multi-material structures.

With support for substrates up to 4 inches (100 mm), LITE provides a compact environment for moving from fundamental materials research toward functional device experimentation.



Closing the Loop: Enabling Recursive Innovation


Flexible for Your Research Environment

Different materials require different processing conditions.

NANOFABRICATOR® LITE performs deposition in open atmospheric conditions and can be upgraded with additional bubblers, ozone generation, and inert processing capabilities.

The optional Inert Module provides a controlled and purified inert environment and can be installed at purchase or retrofitted on site.

This modular approach allows the platform to evolve alongside changing materials, processes, and research requirements.

Materials Innovation
Built for the Lab

NANOFABRICATOR® LITE brings programmable atomic-scale materials processing into a compact R&D platform.

From materials discovery and process development to rapid device prototyping, LITE gives researchers a flexible environment for turning experimental ideas into physical results.

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