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Revolutionizing Prototyping and Design with DALP™

Unleashing Innovation in Semiconductor Technology

DALP™ (Direct Atomic Layer Processing) is transforming the semiconductor industry by dramatically accelerating the transition from ideas to prototypes. This innovative technology enables the creation of complex shapes and material applications previously considered unattainable, by allowing for rapid testing and material exploration.

Benjamin Borie, Ph.D.

Benjamin Borie, Ph.D.

Sensor and Optics Applications Engineer

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Whitepaper Whitepaper

Empowering Precision: The Future of Hyperspectral Imaging

Discover the groundbreaking advancements in hyperspectral imaging with ATLANT 3D’s latest whitepaper on Hyperspectral Filters. This cutting-edge technology, driven by the proprietary DALP™ process, enables unprecedented precision in sensing across a myriad of wavelengths beyond the basic RGB spectrum. By simplifying the fabrication process of optical filters, ATLANT 3D is setting new standards for efficiency, versatility, and cost-effectiveness in applications ranging from astronomy to surveillance. Explore how this innovation is poised to revolutionize industries by providing richer data and insights, atom by atom.

Benjamin Borie, Ph.D.

Benjamin Borie, Ph.D.

Sensor and Optics Applications Engineer

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Whitepaper Whitepaper

Photovoltaics and Electrochemical Energy Storage: From ALD to Atomic-Layer Additive Manufacturing

Explore the forefront of energy technology with our whitepapers, “Photovoltaics and Electrochemical Energy Storage” and “Solid State Batteries with ALD Technology”. These whitepaper offer insights into the evolution from Atomic Layer Deposition (ALD) to Atomic-Layer Additive Manufacturing, highlighting the impact on photovoltaics, energy storage, and battery technologies.

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Solid state batteries with ald technology

Discover the groundbreaking advancements in hyperspectral imaging with ATLANT 3D’s latest whitepaper on Hyperspectral Filters. This cutting-edge technology, driven by the proprietary DALP® process, enables unprecedented precision in sensing across a myriad of wavelengths beyond the basic RGB spectrum. By simplifying the fabrication process of optical filters, ATLANT 3D is setting new standards for efficiency, versatility, and cost-effectiveness in applications ranging from astronomy to surveillance. Explore how this innovation is poised to revolutionize industries by providing richer data and insights, atom by atom.

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Research Article Research Article

Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor

Area-selective atomic layer deposition (AS-ALD) is a bottom-up nanofabrication method delivering single atoms from a molecular precursor. AS-ALD enables self-aligned fabrication and outperforms lithography in terms of cost, resistance, and equipment prerequisites, but it requires pre-patterned substrates and is limited by insufficient selectivity and finite choice of substrates.

Authors: Sonja Stefanovic, Negar Gheshlaghi, David Zanders, Ivan Kundrata, Baolin Zhao, Maïssa K. S. Barr, Marcus Halik, Anjana Devi, Julien Bachmann

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Research Article Research Article

Additive manufacturing in atomic layer processing mode

The invention of atomic-layer additive manufacturing (ALAM): In ALAM, controlled surface chemistry is performed with spatially constrained flows of molecular precursors delivered to the substrate from a microfluidic nozzle. Each pass of the nozzle over any point of the substrate deposits one monolayer of solid. Repeated passes allow for direct patterning deposition of functional materials with Angström vertical resolution.

Authors: Ivan Kundrata, Maïssa K. S. Barr, Sarah Tymek, Dirk Döhler, Boris Hudec, Philipp Brüner, Gabriel Vanko, Marian Precner, Tadahiro Yokosawa, Erdmann Spiecker, Maksym Plakhotnyuk, Karol Fröhlich, Julien Bachmann.

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Patent Patent

ATOMIC LAYER PROCESS PRINTER, 2020

The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.

Authors: Plakhotnyuk, Maksym; Hansen, Ole; Anja, Boisen; Rindzevicius, Tomas; Kundrata, Ivan; Fröhlich, Karol; Bachmann, Julien.

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