Gap4DALP​

Gap4DALP aims to develop a breakthrough solution that will enable atomically precise advanced manufacturing. For that, the consortium will develop the Direct Atomic Layer Processing (DALP) technology with dynamic control of the gap and high-speed of the stages, allowing for the manufacturing of structures with resolutions ≤20 μm. This technology will be integrated into a fabrication machine, the Nanofabricator, to provide the industrial sector with an all-in-one micro-/nanofabrication system that will revolutionize multiple industries. At the project’s end, we will deliver a full prototype of a viable DALP technology with a dynamic gap integrated into the Nanofabricator.​

The global micro/nanofabrication market is populated by multiple players, offering different solutions. Nevertheless, existing solutions are not addressing fast-paced industries’ pains (e.g., Electronic Systems, and Semiconductors & Materials) due to i) high-cost and complexity of the equipment; ii) limited resolution; iii) high environmental impact; and iv) long fabrication times. Gap4DALP micro/nanofabrication technology will address all these pains by providing an all-in-one fabrication machine that is up to 90% less expensive than current solutions, produces devices 10x faster, and has energy, water and waste savings of \>80%.​