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We invite you to experience the NANOFABRICATOR™ LITE and its capabilities in action – from atomic scale thickness variability to multi-cycle and multi-material deposition.

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EXPERIENCE ATOMIC PRECISION

Contact our team to book a demo.

Our team of highly skilled engineers and scientists with extensive expertise in material and process R&D, advanced application development and system engineering are here to help with any questions you may have.

Our services include feasibility studies for validating R&D concepts, proof of technology projects to meet technical requirements, and customized R&D prototyping for innovative engineering solutions. We support your unique challenges and ideas at every stage.

DALP™ Technology

REDEFINING MICROFABRICATION

We enable on-demand next-generation microdevices printing on simple and complex surfaces atom-by-atom.

MEMS and Integrated Sensors, Microfluidics and Lab-on-Chip, RF-devices, Optical and Photonic Devices, Quantum and Energy-Harvesting/Storage Devices can be developed with ATLANT 3D technology with previously impossible functionality and speed at a fraction of a cost.

Our Technology
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NANOFABRICATOR™ LITE

Technical Specification

Substrate

  • Size: up to 4″ (100mm)
  • Substrate Handling​: Wafer
  • Maximum thickness: 10 mm
  • Z direction shape: Flat
  • Holding method: Vacuum
  • Loading: Manual
  • Heater temperature: max. 300°C
  • Heater temp. uniformity: +/- 1%

Process Chamber

  • Environment: Ambient**** uncontrolled
  • Processing speed*: up to 200 mm/sec
  • Deposition area: up to 1.5 mm from wafer edge
  • DALP resolution: 400 μm standard

Gas system

  • Precursor temperature: RT – 150°C
  • Nr. of precursor bubblers: 2**
  • Nr. of reactant bubblers: 1** (H2O***)
  • Nr. of gas reactants: 1**

Options

  • Environment: Inert**** Controlled
  • Additional precursor bubblers: **
  • Additional reactant bubblers: **
  • Additional gas reactants: **

* Dependent on materials to be deposited and customer needs.

** Additional number of bubblers and reactants dependent on customer needs.

*** Additional reactant types dependent on customer needs.

**** Clean room, CLASS 8 min recommended.

***** Argon recommended.

ATLANT 3D
ATLANT 3D
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