Area-selective atomic layer deposition (AS-ALD) is a bottom-up nanofabrication method delivering single atoms from a molecular precursor. AS-ALD enables self-aligned fabrication and outperforms lithography in terms of cost, resistance, and equipment prerequisites, but it requires pre-patterned substrates and is limited by insufficient selectivity and finite choice of substrates. Authors: Sonja Stefanovic, Negar Gheshlaghi, David Zanders, Ivan Kundrata, Baolin Zhao, Maïssa K. S. Barr, Marcus Halik, Anjana Devi, Julien Bachmann Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
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Discover ATLANT 3D's unique atomic layer advanced manufacturing technology based on Direct Atomic Layer Processing (DALP®).
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Our revolutionary tools are built to enhance the whole value chain of advanced micro- and nano-device manufacturing. Our A-HUB solutions enable rapid prototyping, pilots and feasibility studies.
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ADVANCED NANOFABRICATION
Our technology is built for advanced applications enabling previously impossible functionality and speed at a fraction of the cost. Its reach across multiple application domains plays a pivotal role in propelling industries toward cutting-edge technological achievements.
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Learn how we are building the foundation for new advanced materials innovation and high-tech applications of the future.
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We are building the future atomically precise advanced manufacturing technology & infrastructure for micro and nanoelectronics, optics & photonics on Earth and Beyond.
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